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Characteristics of silicon nitride deposited by VHF (162 MHz)-plasma enhanced chemical vapor deposition using a multi-tile push–pull plasma source
Kim, Ki Seok, Sirse, Nishant, Kim, Ki Hyun, Ellingboe, Albert Rogers, Kim, Kyong Nam, Yeom, Geun YoungVolume:
49
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/49/39/395201
Date:
October, 2016
File:
PDF, 2.12 MB
english, 2016