SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Understanding the ion beam in EUV mask blank production
Kearney, Patrick, Naulleau, Patrick P., Wood II, Obert R., Jindal, Vibhu, Weaver, Alfred, Teora, Pat, Sporre, John, Ruzic, David, Goodwin, FrankVolume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916510
File:
PDF, 4.10 MB
english, 2012