Photolysis of Triarylmethylphosphonic Acids and Their Esters
Shi, Min, Okamoto, Yoshiki, Takamuku, SetsuoVolume:
63
Journal:
Bulletin of the Chemical Society of Japan
DOI:
10.1246/bcsj.63.453
Date:
February, 1990
File:
PDF, 1.13 MB
1990