Radiofrequency plasma decomposition of CnF2n+2-H2and...

Radiofrequency plasma decomposition of CnF2n+2-H2and CF4-C2F4mixtures during Si etching or fluoropolymer deposition

Riccardo d'Agostino, Santolo Benedictis, Francesco Cramarossa
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Volume:
4
Language:
english
Pages:
14
DOI:
10.1007/bf00567367
Date:
March, 1984
File:
PDF, 638 KB
english, 1984
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