Aged hydrogen silsesquioxane for sub-10nm line patterns

Microelectronic Engineering 2016 / 09 Vol. 163

Aged hydrogen silsesquioxane for sub-10nm line patterns

Chen, Xi, Zhang, Tao, Constantoudis, Vassilios, Zhang, Shi-Li, Zhang, Zhen
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Volume:
163
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.06.011
Date:
September, 2016
File:
PDF, 788 KB
english, 2016
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