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[OSA CLEO: Science and Innovations - San Jose, California (2015..-..)] CLEO: 2015 - Super-resolution Optical Nanolithography: Beyond the far-field diffraction limit
Majumder, Apratim, Masid, Farhana, Pollock, Benjamin, Andrew, Trisha, Menon, RajeshYear:
2015
Language:
english
DOI:
10.1364/CLEO_SI.2015.STh3M.6
File:
PDF, 163 KB
english, 2015