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[IEEE 2016 American Control Conference (ACC) - Boston, MA, USA (2016.7.6-2016.7.8)] 2016 American Control Conference (ACC) - A nonlinear programming approach to exposure optimization in scanning laser lithography
Fleming, Andrew J., Wills, Adrian, Ghalehbeygi, Omid T., Routley, Ben, Ninness, BrettYear:
2016
Language:
english
DOI:
10.1109/acc.2016.7526580
File:
PDF, 713 KB
english, 2016