Novel Electron-Beam Molecular Resists with High Resolution and High Sensitivity for Nanometer Lithography
Kadota, Toshiaki, Kageyama, Hiroshi, Wakaya, Fujio, Gamo, Kenji, Shirota, YasuhikoVolume:
33
Language:
english
Journal:
Chemistry Letters
DOI:
10.1246/cl.2004.706
Date:
June, 2004
File:
PDF, 187 KB
english, 2004