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A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator
Saito, Yuta, Matsumoto, Kazuya, Higashihara, Tomoya, Ueda, MitsuruVolume:
38
Language:
english
Journal:
Chemistry Letters
DOI:
10.1246/cl.2009.1048
Date:
November, 2009
File:
PDF, 315 KB
english, 2009