[IEEE 2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2016.4.25-2016.4.27)] 2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Excellent resistance variability control of WOx ReRAM by a smart writing algorithm
Lin, Yu-Hsuan, Wu, Jau-Yi, Lee, Ming-Hsiu, Wang, Tien-Yen, Lin, Yu-Yu, Lee, Feng-Ming, Lee, Dai-Ying, Lai, Erh-Kun, Chiang, Kuang-Hao, Lung, Hsiang-Lan, Hsieh, Kuang-Yeu, Tseng, Tseung-Yuen, Lu, Chih-Year:
2016
Language:
english
DOI:
10.1109/vlsi-tsa.2016.7480501
File:
PDF, 2.84 MB
english, 2016