Improvement of a block co-polymer (PS-b-PMMA)-masked...

Nanotechnology 2016 / 09 Vol. 27; Iss. 38

Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam

Yun, Deokhyun, Park, Jinwoo, Kim, Hwasung, Mun, Jeongho, Kim, Sangouk, Kim, Kyongnam, Yeom, Geunyoung
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Volume:
27
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/27/38/384002
Date:
September, 2016
File:
PDF, 2.12 MB
english, 2016
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