Microscopic analysis of Erase-induced degradation in 40nm...

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IEEE Transactions on Device and Materials Reliability 2016

Microscopic analysis of Erase-induced degradation in 40nm NOR Flash Technology

Torrente, Giulio, Coignus, Jean, Vernhet, Alexandre, ogier, jean-luc, Roy, David, Ghibaudo, Gerard
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Year:
2016
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2016.2613138
File:
PDF, 348 KB
english, 2016
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