A Multi-Scale Study on Silicon-Oxide Etching Processes in...

Plasma Science and Technology 2016 / 06 Vol. 18; Iss. 6

A Multi-Scale Study on Silicon-Oxide Etching Processes in C 4 F 8 /Ar Plasmas

Sui, Jiaxing, Zhang, Saiqian, Liu, Zeng, Yan, Jun, Dai, Zhongling
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Volume:
18
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/18/6/14
Date:
June, 2016
File:
PDF, 3.39 MB
english, 2016
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