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[IEEE 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2016.6.12-2016.6.13)] 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Contact resistance reduction on layered MoS2 by Ar plasma pre-treatment
Ho, Yen-Teng, Chu, Yung-Ching, Jong, Chao An, Chen, Hung-Yi, Lin, Meng-Wei, Zhang, Ming, Chien, Po-Yen, Tu, Yung-Yi, Woo, Jason, Chang, Edward YiYear:
2016
Language:
english
DOI:
10.1109/SNW.2016.7577981
File:
PDF, 429 KB
english, 2016