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[IEEE 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2016.6.12-2016.6.13)] 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Current compliance impact on the variability of HfO2-based RRAM devices
Zhang, Meiyun, Long, Shibing, Li, Yang, Liu, Qi, Lv, Hangbing, Liu, MingYear:
2016
Language:
english
DOI:
10.1109/SNW.2016.7578002
File:
PDF, 1016 KB
english, 2016