[IEEE 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2016.6.12-2016.6.13)] 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Improved electrical and reliability characteristics in Ge p-MOSFETs with in-situ plasma treatments and capping Hf/Zr on interfacial layers
Li, Yan-Lin, Chang-Liao, Kuei-Shu, Yi, Shih-HanYear:
2016
Language:
english
DOI:
10.1109/SNW.2016.7578005
File:
PDF, 1.15 MB
english, 2016