[IEEE 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2016.6.12-2016.6.13)] 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - High quality Ge-OI, III–V-OI on 200 mm Si substrate
Lee, Kwang Hong, Lin, Yiding, Bao, Shuyu, Zhang, Li, Lee, Kenneth, Michel, Jurgen, Fitzgerald, Eugene, Tan, Chuan SengYear:
2016
Language:
english
DOI:
10.1109/SNW.2016.7578032
File:
PDF, 1.43 MB
english, 2016