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Mechanism of formation of ultrashallow thermal donors in carbon-doped oxygen-rich monocrystalline silicon preannealed to introduce hydrogen
Hara, Akito, Awano, TeruyoshiVolume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.101302
Date:
October, 2015
File:
PDF, 786 KB
english, 2015