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Experimental and theoretical rationalization of the growth mechanism of silicon quantum dots in non-stoichiometric SiN x : role of chlorine in plasma enhanced chemical vapour deposition
Mon-Pérez, E, Salazar, J, Ramos, E, Salazar, J Santoyo, Suárez, A López, Dutt, A, Santana, G, Monroy, B MarelVolume:
27
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/27/45/455703
Date:
November, 2016
File:
PDF, 4.18 MB
english, 2016