Structural and electrical properties of ultra-thin high-k...

Materials Science in Semiconductor Processing 2016 / 12 Vol. 56

Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD

Patil, V.S., Agrawal, K.S., Khairnar, A.G., Thibeault, B.J., Mahajan, A.M.
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Volume:
56
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2016.08.025
Date:
December, 2016
File:
PDF, 816 KB
english, 2016
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