Correlations between the properties and the deposition kinetics of low-temperature chemical vapour deposited SiO2films: the effect of O2/SiH4mole ratio
C. Pavelescu, C. CobianuVolume:
9
Language:
english
Pages:
2
DOI:
10.1007/bf00727697
Date:
February, 1990
File:
PDF, 123 KB
english, 1990