Acceleration of e-beam lithography by minimized resist...

Microelectronic Engineering 2016 / 12 Vol. 166

Acceleration of e-beam lithography by minimized resist exposure for large scale nanofabrication

Deng, Jie, Wong, Ten It, Sun, Ling Ling, Quan, Chenggen, Zhou, Xiaodong
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Volume:
166
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.09.002
Date:
December, 2016
File:
PDF, 4.25 MB
english, 2016
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