Microstructure evolution of amorphous silicon thin films...

Materials Science in Semiconductor Processing 2016 / 12 Vol. 56

Microstructure evolution of amorphous silicon thin films upon annealing studied by positron annihilation

Wang, Xiaonan, He, Xiaoyu, Mao, Wenfeng, Zhou, Yawei, Lv, Shuliang, He, Chunqing
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Volume:
56
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2016.09.019
Date:
December, 2016
File:
PDF, 667 KB
english, 2016
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