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Study of the effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS
Loch, Daniel A.L., Ehiasarian, Arutiun P.Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2016.10.018
Date:
October, 2016
File:
PDF, 878 KB
english, 2016