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Comparative study of the lubricating behavior between 12-in. copper disk and wafer during chemical mechanical polishing
Zhao, Dewen, He, Yongyong, Wang, Tongqing, Lu, XinchunVolume:
105
Language:
english
Journal:
Tribology International
DOI:
10.1016/j.triboint.2016.09.019
Date:
January, 2017
File:
PDF, 875 KB
english, 2017