SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue
Kasprowicz, Bryan S., Buck, Peter D., Takei, Satoshi, Sugino, Naoto, Kameda, Takao, Nakajima, Shinya, Hanabata, MakotoVolume:
9985
Year:
2016
Language:
english
DOI:
10.1117/12.2243401
File:
PDF, 635 KB
english, 2016