Improving the growth of Ge/Si islands by modulating the spacing between screen and accelerator grids in ion beam sputtering deposition system
Yang, Jie, Zhao, Bo, Wang, Chong, Qiu, Feng, Wang, Rongfei, Yang, YuVolume:
386
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2016.05.175
Date:
November, 2016
File:
PDF, 1.57 MB
english, 2016