Localization of 4 f State in...

Journal of the Physical Society of Japan 2006 / 11 Vol. 75; Iss. 11

Localization of 4 f State in YbRh 2 Si 2 under Magnetic Field and High Pressure: Comparison with CeRh 2 Si 2

Knebel, G., Boursier, R., Hassinger, E., Lapertot, G., G. Niklowitz, P., Pourret, A., Salce, B., P. Sanchez, J., Sheikin, I., Bonville, P., Harima, H., Flouquet, J.
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Volume:
75
Language:
english
Journal:
Journal of the Physical Society of Japan
DOI:
10.1143/JPSJ.75.114709
Date:
November, 2006
File:
PDF, 2.56 MB
english, 2006
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