Anomalous rapid diffusion of phosphorus caused by heavily...

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Vacuum 2016 / 10

Anomalous rapid diffusion of phosphorus caused by heavily implanted carbon in pre-amorphized ultrashallow junctions

Chang, Ruey-Dar, Liao, Hsueh-Chun, Tai, Chih-Ming
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Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2016.10.003
Date:
October, 2016
File:
PDF, 706 KB
english, 2016
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