Influence of Substrate Temperature on Deposition Rate and...

Key Engineering Materials 2016 / 1 Vol. 675-676

Influence of Substrate Temperature on Deposition Rate and Optical Properties of Aluminum Oxide Thin Films Prepared by Reactive DC Sputtering Technique

Hom-On, Chatpawee, Horprathum, Mati, Eiamchai, Pitak, Limwichean, Sakson, Patthanasetakul, Viyapol, Nuntawong, Noppadon, Chananonnawathorn, Chanunthorn, Triroj, Napat, Jaroenapibal, Papot
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Volume:
675-676
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/kem.675-676.281
Date:
January, 2016
File:
PDF, 315 KB
english, 2016
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