[IEEE 2016 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2016.6.14-2016.6.16)] 2016 IEEE Symposium on VLSI Technology - White spots reduction by ultimate proximity metal gettering at carbon complexes formed underneath contact area in CMOS image sensors
Yamaguchi, Tadashi, Yamashita, Tomohiro, Kamino, Takeshi, Goto, Yotaro, Kuroi, Takashi, Matsuura, MasazumiYear:
2016
Language:
english
DOI:
10.1109/VLSIT.2016.7573447
File:
PDF, 564 KB
english, 2016