The effects of thermal nitridation on phosphorus diffusion in strained SiGe and SiGe:C
Lin, Yiheng, Yasuda, Hiroshi, Schiekofer, Manfred, Xia, GuangruiVolume:
51
Language:
english
Journal:
Journal of Materials Science
DOI:
10.1007/s10853-015-9475-1
Date:
February, 2016
File:
PDF, 1.89 MB
english, 2016