[IEEE 2016 38th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) - Garden Grove, CA, USA (2016.9.11-2016.9.16)] 2016 38th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) - Influence of machine configuration on EOS damage during wafer cleaning process

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