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[IEEE 2016 IEEE International Nanoelectronics Conference (INEC) - Chengdu, China (2016.5.9-2016.5.11)] 2016 IEEE International Nanoelectronics Conference (INEC) - Impacts of metastable defect states on gate oxide trapping in nanoscale MOS devices
Mao, Dongyuan, Guo, Shaofeng, Wang, Runsheng, Huang, Ru, Liu, ChangzeYear:
2016
Language:
english
DOI:
10.1109/INEC.2016.7589302
File:
PDF, 495 KB
english, 2016