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Improving Thermal Stability and Interface State Density of High- $\kappa $ Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
Tsai, Yi-He, Chou, Chen-Han, Shih, An-Shih, Jau, Yu-Hau, Yeh, Wen-Kuan, Lin, Yu-Hsien, Ko, Fu-Hsiang, Chien, Chao-HsinVolume:
37
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2016.2613999
Date:
November, 2016
File:
PDF, 791 KB
english, 2016