Improving Thermal Stability and Interface State Density of...

IEEE Electron Device Letters 2016 / 11 Vol. 37; Iss. 11

Improving Thermal Stability and Interface State Density of High- $\kappa $ Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium

Tsai, Yi-He, Chou, Chen-Han, Shih, An-Shih, Jau, Yu-Hau, Yeh, Wen-Kuan, Lin, Yu-Hsien, Ko, Fu-Hsiang, Chien, Chao-Hsin
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Volume:
37
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2016.2613999
Date:
November, 2016
File:
PDF, 791 KB
english, 2016
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