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[IEEE 2016 IEEE International Conference on Plasma Science (ICOPS) - Banff, AB, Canada (2016.6.19-2016.6.23)] 2016 IEEE International Conference on Plasma Science (ICOPS) - Influence of driving method on discharge mode of damage free remote plasma removal process for semiconductor manufacturing
Cho, Tae S, Han, Qing, Park, Soonam, Lubomirsky, Dima, Venkataraman, ShankarYear:
2016
Language:
english
DOI:
10.1109/plasma.2016.7534008
File:
PDF, 101 KB
english, 2016