SPIE Proceedings [SPIE 32nd European Mask and Lithography Conference - Dresden, Germany (Tuesday 21 June 2016)] 32nd European Mask and Lithography Conference - Researching new EUV pellicle films for source powers beyond 250 watts
Behringer, Uwe F.W., Finders, Jo, Nasalevich, Maxim, van Zwol, Pieter Jan, Abegg, Erik, Voorthuijzen, Pim, Vles, David, Péter, Mária, van der Zande, Wim, Vermeulen, HansVolume:
10032
Year:
2016
Language:
english
DOI:
10.1117/12.2255040
File:
PDF, 506 KB
english, 2016