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Study of plasma radiation spectra of (HCl + Ar, H2, and Cl2) mixtures in GaAs etching
Dunaev, A. V.Volume:
45
Language:
english
Journal:
Russian Microelectronics
DOI:
10.1134/S1063739716050048
Date:
September, 2016
File:
PDF, 755 KB
english, 2016