Thermal Atomic Layer Deposition of TaAlC with TaCl...

ECS Journal of Solid State Science and Technology 2016 Vol. 5; Iss. 10

Thermal Atomic Layer Deposition of TaAlC with TaCl 5 and TMA as Precursors

Xiang, Jinjuan, Li, Tingting, Wang, Xiaolei, Du, Liyong, Ding, Yuqiang, Wang, Wenwu, Li, Junfeng, Zhao, Chao
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Volume:
5
Year:
2016
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0261610jss
File:
PDF, 497 KB
english, 2016
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