[IEEE 2016 IEEE International Conference on Plasma Science...

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[IEEE 2016 IEEE International Conference on Plasma Science (ICOPS) - Banff, AB, Canada (2016.6.19-2016.6.23)] 2016 IEEE International Conference on Plasma Science (ICOPS) - Optimizing remote plasma sources for selective etching

Huang, Shuo, Kushner, Mark J., Volynets, Vladimir, Lee, Sangheon, Song, In-Cheol, Lu, Siqing, Hamilton, James R., Tennyson, Jonathan
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Year:
2016
Language:
english
DOI:
10.1109/plasma.2016.7534327
File:
PDF, 108 KB
english, 2016
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