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[IEEE 2016 IEEE International Conference on Plasma Science (ICOPS) - Banff, AB, Canada (2016.6.19-2016.6.23)] 2016 IEEE International Conference on Plasma Science (ICOPS) - Investigation of inductively coupled SF6 plasma etching of Si and SiO2 throught a global model coupled with langmuir adsorption kinetics
Toneli, David A., Pessoa, Rodrigo S., Roberto, MarisaYear:
2016
Language:
english
DOI:
10.1109/plasma.2016.7533983
File:
PDF, 73 KB
english, 2016