Chlorine-Based Dry Etching of III/V Compound Semiconductors for Optoelectronic Application
Asakawa, Kiyoshi, Yoshikawa, Takashi, Kohmoto, Shigeru, Nambu, Yoshihiro, Sugimoto, YoshimasaVolume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.373
Date:
February, 1998
File:
PDF, 4.01 MB
english, 1998