Sub-10 nm feature chromium photomasks for contact...

Scientific Reports 2016 / 3 Vol. 6

Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays

Park, Woongkyu, Rhie, Jiyeah, Kim, Na Yeon, Hong, Seunghun, Kim, Dai-Sik
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Volume:
6
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/srep23823
Date:
March, 2016
File:
PDF, 902 KB
english, 2016
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