Depth-dependent self-annealing behavior of electroplated Cu

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Depth-dependent self-annealing behavior of electroplated Cu

Chen, Chang-Chih, Yang, Cheng-Hsien, Wu, Ying-Syuan, Ho, Cheng-En
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Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2016.11.057
Date:
November, 2016
File:
PDF, 701 KB
english, 2016
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