SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Observation of swelling behavior of ArF resist during development by using QCM method
Sekiguchi, Atsushi, Konishi, Hiroko, Isono, Mariko, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916038
File:
PDF, 3.19 MB
english, 2012