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Effect of Ultrathin Silicon Oxide Film for Enhanced Performance and Reliability of Metal-Induced Laterally Crystallized Thin-Film Transistors Using Silicon Nitride as a Gate Dielectric
Chae, Hee Jae, Kim, Hyung Yoon, Lee, Sol Kyu, Seok, Ki Hwan, Lee, Yong Hee, Kiaee, Zohreh, Joo, Seung KiVolume:
5
Year:
2016
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0121614jss
File:
PDF, 675 KB
english, 2016