Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al 2 O 3 as gate dielectric
Zhang, Kexiong, Liao, Meiyong, Imura, Masataka, Nabatame, Toshihide, Ohi, Akihiko, Sumiya, Masatomo, Koide, Yasuo, Sang, LiwenVolume:
9
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.9.121002
Date:
December, 2016
File:
PDF, 1.32 MB
english, 2016