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SPIE Proceedings [SPIE 32nd European Mask and Lithography Conference - Dresden, Germany (Tuesday 21 June 2016)] 32nd European Mask and Lithography Conference - Advanced photomask fabrication by e-beam lithography for mask aligner applications
Behringer, Uwe F.W., Finders, Jo, Weichelt, T., Bourgin, Y., Banasch, M., Zeitner, U. D.Volume:
10032
Year:
2016
Language:
english
DOI:
10.1117/12.2248545
File:
PDF, 769 KB
english, 2016