Recombination reduction at the c-Si/RCA oxide interface...

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Applied Surface Science 2016 / 11

Recombination reduction at the c-Si/RCA oxide interface through Ar-H2 plasma treatment

Landheer, Kees, Bronsveld, Paula C.P., Poulios, Ioannis, Tichelaar, Frans D., Kaiser, Monja, Schropp, Ruud E.I., Rath, Jatin K.
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Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2016.11.119
Date:
November, 2016
File:
PDF, 941 KB
english, 2016
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