Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition
Chiba, Hirokazu, Hirano, Masaki, Kawano, Kazuhisa, Oshima, Noriaki, Funakubo, HiroshiLanguage:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2016.11.032
Date:
November, 2016
File:
PDF, 826 KB
english, 2016